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Journal of Metals, Materials and Minerals

Publication Date

2021

Abstract

This research aimed to improve the properties of chromium nitride (CrN) film coatings by addition of zirconium (Zr) as the third element to form Cr-Zr-N ternary nitride. DC unbalanced magnetron sputtering method was used to form Cr-Zr-N film with various Zr/Zr + Cr atomic ratios.  Mechanical properties, surface morphology and crystal structure of the film were investigated. In the research, Cr-Zr-N film were categorised into 3 types with different Zr amount: low zirconium, (Zr/Zr + Cr = 0.29), medium zirconium (Zr/Zr + Cr = 0.44), and high zirconium (Zr/Zr + Cr = 0.74). All Cr-Zr-N films exhibited nano-crystalline structures with lower surface roughnesses than those of crystalline CrN film. With Zr addition, the highest hardness of Cr-Zr-N coating layer increased to 1762.7HV, in the low Zr film. Likewise, Young’s modulus value increased from 213.9 GPa for the Cr-N film to 269.0 GPa for the low Zr film. Both surface hardness and Young’s modulus slightly decreased when the amount of Zr in the ternary Cr-Zr-N film increased. The nano-crystalline Cr-Zr-N film exhibited better adhesion comparing to the binary Cr-N film. Scratch test showed the increased critical load (LC1) from 1.91 N for the CrN film to 3.21 N for the ternary Cr-Zr-N film.

First Page

69

Last Page

75

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