Electrochromic property of tungsten trioxide films prepared by DC magnetron sputtering with oblique angle deposition and thermal oxidation

Authors

• Chantana Aiempanakit
• Areeya Chanachai
• Nattaya Kanchai
• Montri Aiempanaki
• Kamon Aiempanakit

Publication Date

2021

Abstract

In this work, WO3 thin films were prepared in two steps: First, tungsten (W) films with thickness of 100-300 nm were deposited by DC magnetron sputtering with oblique angle deposition (OAD) technique at 0 and 85. Second, sputtered W films were annealed under air atmosphere at a temperature of 500℃ and different oxidation times for 1-3 h. The structure of WO3 thin films were examined by X-ray diffraction and field emission scanning electron microscope. In addition, the optical and electrochromic properties of the WO3 thin films were measured by a spectrophotometer before and after testing in potassium hydroxide electrolytes. The results showed that the OAD technique can enhance porosity and exert high oxidation in W films. The increase in film thickness and oxidation time indicated that the crystallinity of WO3 films increased. The condition of WO3 films for OAD at 85, thickness of 300 nm, and oxidation time of 1 h showed the best electrochromic property with the highest optical modulation and current density.

DOI

10.55713/jmmm.v31i2.1084

First Page

123

Last Page

128

Recommended Citation

Aiempanakit, Chantana; Chanachai, Areeya; Kanchai, Nattaya; Aiempanaki, Montri; and Aiempanakit, Kamon (2021) "Electrochromic property of tungsten trioxide films prepared by DC magnetron sputtering with oblique angle deposition and thermal oxidation," Journal of Metals, Materials and Minerals: Vol. 31: No. 2, Article 17.
DOI: 10.55713/jmmm.v31i2.1084
Available at: https://digital.car.chula.ac.th/jmmm/vol31/iss2/17